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Comparing the Accuracy and Repeatability of On-Wafer Calibration Techniques to 110GHz Anthony J Lord Cascade Microtech Europe Ltd, 3 Somerville Court, Banbury Business Park, Adderbury, Oxfordshire, UK [email protected] Abstract Methods & Limitations Many methods of making corrected S-Parameters Three different calibration standard substrates were measurements are available for on-wafer devices and used for the comparisons. One GaAs substrate for the circuits. This is a comparative study of calibration NIST Multi-Line (LRL) calibration [1], and two alumina techniques, presented as most accurate and repeatable for substrates for Short-Open-Load-Through (SOLT), Line- making on-wafer measurements. Reflect Match (LRM) and Line-Reflect-Reflect-Match (LRRM) calibrations. One alumina substrate being 625um Introduction thick, and the other 250um thick. As a recommendation from Ref. [2], the thin ISS included a layer of Radiation An on going concern when making on-wafer Absorption Material (RAM) between the Impedance calibrations and measurements is exactly how accurate and Standard Substrate and metal chuck surface. repeatable are the measurements you're making. Because A major limitation of the paper is lack of a reliable of the complexity and diversity of the measurement system precision reference measurement, to 110GHz. An it makes traceability back to a physical reference extrapolation was made from the results of Ref. [3] to impractical. We can however compare the complete cover the higher frequency band. The NIST LRL measurement system, including probes, calibration calibration standards are not a modelled 50ohm standards and algorhythms to a benchmark standard transmission line to 110GHz and a miss-match to 50ohm defined by the National Institute of Standards and calibrations can be expected. My LRL calibration Technology (NIST). With the growing interest in reference planes were at the centre of the 500um thru' line, millimeter-wave devices due to gro