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Effect of Annealing on 50nm Gold Films
Application Note
Abstract
Ultra-thin gold ilms are used in many
Ref Description Condition
modern applications to impart essen-
A 50nm gold ilm on bare wafer (fused Al2O3 and TiC) As deposited
tial optical qualities to surfaces. In this
work, a new nanoindentation technolo- A' 50nm gold ilm on bare wafer (fused Al2O3 and TiC) Annealed 3 hrs
gy, Express Test, is used to evaluate the B 50nm gold ilm on 2.6m of Al2O3 on bare wafer As deposited
effect of annealing on 50nm gold ilms. 50nm gold ilm on 2.6m of Al2O3 on bare wafer Annealed 3 hrs
B'
Vacuum annealing for three hours (sub
300