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Vacuum References

TABLE OF CONTENTS
VACUUM TECHNOLOGY BOOKS ................................................................................................................................ 2
RESIDUAL GAS ANALYSIS ......................................................................................................................................... 2
APPLICATIONS OF RESIDUAL GAS ANALYZERS TO PROCESS/QUALITY CONTROL ..................................................... 4
SPECIALIZED/UNUSUAL APPLICATIONS OF RGAS ..................................................................................................... 7
HIGH PRESSURE SAMPLING/ DIFFERENTIAL PUMPING .............................................................................................. 9
QUANTITATIVE MEASUREMENTS WITH RESIDUAL GAS ANALYZERS ...................................................................... 10
MULTIPLE LINEAR REGRESSION ANALYSIS ALGORITHMS ...................................................................................... 11
VACUUM SYSTEM DESIGN ...................................................................................................................................... 11
VACUUM SYSTEM CONTAMINATION ....................................................................................................................... 16
VACUUM PUMPS ..................................................................................................................................................... 18
TOTAL PRESSURE MEASUREMENT .......................................................................................................................... 22
BAYARD-ALPERT IONIZATION GAUGES .................................................................................................................. 24
PIRANI/THERMOCOUPLE GAUGES ........................................................................................................................... 27
PRESSURE CALIBRATION/SPINNING ROTOR GAUGE ................................................................................................ 27
TEMPERATURE PROGRAMMED DESORPTION ........................................................................................................... 29
MEMBRANE INTRODUCTION MASS SPECTROMETRY (MIMS) ................................................................................. 31
VARIABLE LEAK VALVES........................................................................................................................................ 31
VACUUM AND PROCESS CONTROL PUBLICATIONS .................................................................................................. 31
VACUUM AND PROCESS CONTROL WEBSITES ......................................................................................................... 32




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Vacuum Technology Books
1. J. M. Lafferty , editor, "Foundations of Vacuum Science and Technology", John
Wiley and Sons, Inc., NY, 1998. Note: A great book that every vacuum practitioner
should own.

2. J. H. Leck, "Total and Partial Pressure Measurement in Vacuum Systems", Blackie,
Glasgow&London, 1989. Note: Another classic. Great chapters on gauging.

3. Armand Berman, "Total Pressure Measurements in Vacuum Technology", Academic
Press, Orlando, FL, 1985

4. J. F. O'Hanlon, "A user's guide to Vacuum Technology", 2nd. Ed. , Wiley, NY, 1989.

5. Gerhard Lewin, "An Elementary Introduction to Vacuum Technique", AVS
Monograph Series, American Institute of Physics, Inc. NY, NY, 1987. Note: Great
Little reference book.

6. John H. Moore et. al. , "Building Scientific Apparatus: A Practical Guide to Design
and Construction, 2nd edition", Addison Wesley, Redwood City, CA, 1989. Note:
Every science research laboratory must have a copy of this book on its shelfs. The
Vacuum Technology chapter (Chapter 3, p. 75) provides one of the best
introductions to vacuum technology and vacuum system design we have ever seen!

7. Walter H. Kohl, "Handbook of Materials and Techniques for Vacuum Devices",
American Vacuum Society Classics, AIP Press, New York, 1995.

8. Phil Danielson, "Building a Vacuum Library", R&D, March 2002, p. 34

9. Special Issue Journal Of Vacuum Science and Technology A, Second Series,
Volume 21, Number 5, Supplement. Note: Very useful Vacuum Science and
Technology papers by P. A. Redhead, J. P. Hobson, P. A. Redhead , Kimo Welch
and H. F. Dylla. Including gauging, pumping and UV technologies.

Residual Gas Analysis
1. Dawson, "Quadrupole Mass Spectrometry and Its Applications", AIP Press, NY,
1995.

2. Drinkwine and D. Lichtman, "Partial Pressure Analyzers and Analysis", AVS
Monograph Series published by the Education Committee of the American Vacuum
Society. http://www.avs.org.

3. Anne B. Giordani et. al., "What is Mass Spectrometry?", 1998, a supplement to the
Journal of the American Society of Mass Spectrometry. http://www.asms.org.

4. Basford et. al., J. Vac. Sci. Technol. A 11(3) (1993) A22-40: "Recommended
Practice for the Calibration of Mass Spectrometers for Partial Pressure Analysis.
Update to AVS Standard 2.3". http://www.avs.org


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www.thinkSRS.com Vacuum References 3

5. Batey, Vacuum, 37 (1987) 659-668:" Quadrupole Gas Analyzers"

6. Fu Ming Mao et. al., Vacuum, 37 (1987) 669-675: " The quadrupole mass
spectrometer in practical operation"

7. Dawson, Mass Spectrometry Reviews, 5 (1986) 1-37: "Quadrupole mass analyzers:
Performance, design, and some recent applications"

8. Austin et. al., Vacuum 41(1990)2001, "Optimization of the operation of the small
quadrupole mass spectrometer to give minimum long-term instability"

9. M. G. Rao and C. Dong, J. Vac. Sci. Technol. A 15(3) (1997) 1312, "Evaluation of
low cost residual gas analyzers for ultrahigh vacuum applications". Note: The RGA
models in this paper are: A: MKS PPT 050EM, B: SRS 100 AMU with electron
multiplier, C: MKS PPT 200EM, D: Balzers QMS 200 M, E: Leybold Inficon High
performance Transpectorr H100M as indicated by the authors.

10. S. Daolio, et. al., "Quadrupole Secondary Ion Mass Spectrometer for Simultaneous
Detection of Positive and Negative Ions", Rapid. Commun. Mass Spectrom. 13
(1999) 782-785

11. Changkung Dong and G. Rao Myneni, "Field emitter based extractor gauges and
residual gas analyzers", J. Vac. Sci. Technol. A17(4) (1999) 2026. Note: An SRS
RGA was retrofitted with a Spindt-type field emitter array. Residual gas spectra
indicate reduced O, Cl and F electron stimulated desorption.

12. Shue Watanabe, Hitoshi Oyama, Shigeki Kato and Masakazu Aono, "Measurement
of partial pressures in extremely high vacuum region using a modified residual gas
analyzer", Rev. Sci. Instr. 70 (1999) 1880

13. T. E. Felter, "Cold cathode emitter array on a quadrupole mass spectrometer: Route
to miniaturization", J. Vac. Sci. Technol. B 17(5), Sept/Oct 1999, p. 1993

14. J. H. Batey, "Thermal Desorption from mass spectrometer filaments", Vacuum 43(1)
(1992) 15

15. J. R. Gibson, S. Taylor and J. H. Leck, "Detailed simulation of mass spectra for
quadrupole mass spectrometer systems", J. Vac. Sci. Technol. A 18(1) (2000) 237

16. Ma'an H. Amad and R. S. Houk, "Mass resolution of 11,000 to 22,000 with a
multiple pass Quadrupole mass analyzer", J. Am. Soc. Mass Spectrom. 11 (2000)
407. Note: Very clever way to get awesome resolution out of a small Quad.

17. J. R. Gibson and Stephen Taylor, "Prediction of quadrupole mass filter performance
for hyperbolic and circular cross section electrodes", Rapid Communications in
Mass Spectrometry, 14 (2000) 1669. Note: Improved computational method used to
calculate throughput of quadrupole filters with circular and hyperbolic shaped rods.




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18. Sharon Lewis, "Simplifying the Residual Gas Analyzer", R&D Magazine, October
2000, p. 21.

19. S. Boumsellek and R. J. Ferran, "Trade Offs in Miniature Quadrupole Designs", J.
Am. Soc. Mass Spectrom. 12 (2001) 633. Note: A complete article describing the
inherent advantages and limitations of small quadrupole designs.

20. Gerardo A. Brucker, "How to use an RGA", R&D Magazine, June 2001, p. 13.

21. Bob Langley and Paul LaMarche, "Mass Spectrometer Basics and Operation",
Vacuum Technology and Coating, Oct. 2002. P. 20.

22. Ethan Badman, R. Graham Cooks, "Miniature Mass Analyzers", J. Mass Spectrom.
35 (2000)659

23. S. Taylor et.al., "A miniature mass spectrometer for chemical and biological
sensing", Proc. SPIE 4036 (2000) 187.

24. B. Wilamowski, et.al., "Enhancing the sensitivity of miniutarized mass
spectrometers", IECON'01, 27th Annual Conference of the IEEE Industrial
Electronics Society, p. 147.

25. Phil Danielson, "Will RGAs Replace Ion Gauges?", R&D Magazine, June 2003, p.
31. Note: Is an Ion Gauge good enough? When is an RGA required? Phil Danielson
joins this long-standing debate...

26. Vladimir I. Baranov, "Analytical Approach for Description of Ion Motion in QMS",
J. Am. Soc. Mass Spectrom. 14 (2003) 818.

27. Vladimir I. Baranov, "Analytical approach for description of Ion Motion in
Quadrupole Mass Spectrometer", J. Am. Soc. Mass Spectrom. 14 (2003) 818-82

28. N. Ogiwara, K. Suganuma , Y. Miyo , S. Kobayashi and Y. Saito, "Application of
the field emitter array to the vacuum measurements", Applied Surface Science, 146(
1999)234-238. Note: A Spindt emitter array is interfaced to an RGA.

29. Bob Langley and Paul LaMarche, "Analyzing Spectrometer Hydrocarbon Spectra",
Vac. Technology and Coating, Oct. 2003, p. 22.

30. E. Lanzinger, et. al., "Partial Pressure Measurement by means of infrared laser
absorption spectroscopy", Vacuum 51 (1998) 47-51.

Applications of Residual Gas Analyzers to
Process/Quality Control
1. O'Hanlon, J. Vac. Sci. Technol. A 12 (4), Jul/Aug 1994: "Ultrahigh vacuum in the
semiconductor industry"



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www.thinkSRS.com Vacuum References 5

2. Vic Comello, R&D Magazine, September 1993, p. 65: "Process Monitoring with
"Smart" RGAs"

3. Waits, et. al., Semiconductor International, May 1994, p. 79: " Controlling your
Vacuum Process: Effective Use of a QMA"

4. Rosenberg, Semiconductor International, October 1995, p. 149: "The Advantages of
Continuous On-line RGA Monitoring".

5. Lakeman, Semiconductor International. October 1995, p. 127: "Increase overall
Equipment Effectiveness with In Situ Mass Spectrometry".

6. Semiconductor International Magazine, October 1995, p. 70, " Researchers
Demonstrate Viability of QMS for In Situ Diagnostics"

7. L.L. Tedder, et. al., J. Vac. Sci. Technol. B, 13(4) (1995) 1924, "Real-time process
and product diagnostics in rapid thermal chemical vapor deposition using in situ
mass spectrometry sampling"

8. C. D'Couto and Sanjay Tripathi, Semiconductor International, July 1996, p. 343,
"Residual Gas Analysis Suggests Process Improvement"

9. R. W. Rosenberg, Semiconductor International, October 1995, p. 149, "The
Advantages of Continuous On-line RGA Monitoring"

10. Vic Comello, "Using RGAs for Process Monitoring", R&D Magazine, October
1997, p. 33. ("Back to Basics" article)

11. Vic Comello, "RGAs Provide Real Time Process Control", Semiconductor
International, September 1990.

12. P. Ausloos et. al., "The Critical Evaluation of a Comprehensive Mass Spectral
Library", J. Am. Soc. Mass Spec., 10 (1999) 287-299.

13. Robert Waits, "Semiconductor and thin film applications of a quadrupole mass
spectrometer", J. Vac. Sci. Technol. A 17(4) (1999) 1469. Note: A very good paper
on applications of mass spectrometers to semiconductor processes. Highly
recommended, probably required, reading!

14. Guangquan Lu, Laura L. Tedder and Gary W. Rubloff, "Process sensing and
metrology in gate oxide growth by rapid thermal chemical vapor deposition from
SiH4 and N2O", J. Vac. Sci. Technol. B17(4) (1999) 1417

15. Brian Dickson, et. al., "Vacuum-based Process Toll Diagnostics: How to expose
trends and problems that the tolls themselves cannot detect", Vacuum and ThinFilm,
August 1999, p.30

16. T. P. Schneider et. al., "Real-time in situ residual gas monitorring", FUTURE FAB
International, issue 4, volume 1, p.237.


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17. A. G. Chakhovskoi, C. E. Hunt, M.E. Malinowski, "Gas Desorption electron
stimulated during operation of field emitter-phosphor screen pairs", Displays, 19
(1999) 179-184

18. Xi Li et. al., "Mass Spectrometric measurements on inductively coupled
fluorocarbon plasmas: Positive Ions, Radicals, and Endpoint Detection", J. Vac. Sci.
Technol. A17(5) (1999) 2438

19. Jim Snow, Stuart Tison and Walter Plante, "Evolving gas flow, measurement, and
control technologies", Solid State Technology, October 1999, p. 51.

20. Paul Espitalier-Noel, "Integrate gas, chemical, vacuum, and exhaust design", Solid
State Technology, Oct. 1999, p. 65

21. Charles C. Allgood, "Impact and behavior of trace contaminants in high purity
plasma process gases", Solid State Technology, Sept. 1999, p. 63

22. K. C. Lin, "Continuous Gas Monitoring Reduces Losses", Semiconductor
International, May 1999.

23. Babu R. Chalamala, David Uebelhoer and Kenneth A. Dean, "Apparatus for
quantitative analysis of residual gases in flat panel vacuum packages", J. Vac. Sci.
Technol. A 18(2) (2000) 1. Note: Uses and SRS RGA300 for quantitative analysis
of residual gases in flat panel displays.

24. Robert K. Waits, "Monitoring residual and process gases in PVD processes: The
importance of sensitivity", MICRO Magazine, June 1997, p. 81. Note: A great article
including useful information on the effects of contaminants on sputter deposited
films.

25. Russ Carr, "Sensor Automates Detection of Photoresist Residues", R&D Magazine,
March 2000, p. 51

26. Robert Waits, "Evolution of integrated-circuit vacuum processes: 1959-1975", JVST
A 18(4) (2000) 1736.

27. C. B. Yarling "History of Industrial and commercial ion implantation: 1906-1978",
JVST A 18 (4) (2000) 1746.

28. Thomas P. Scneider et. al. , "Using partial pressure analysis to monitor wet clean
recovery", Solid State Technology, August 2000, p. 117

29. Donald M. Mattox, "Applications of Vacuum Coating", Vacuum Technology and
Coating, May 2001, p. 16.

30. Surajed Promreuk, "Achieving process understanding and real-time fault detection
on a PVD toll", MICRO Magazine, March 2002, p. 45.




Stanford Research Systems Phone: (408) 744-9040
www.thinkSRS.com Vacuum References 7

31. Steve Whitten, et. al., "Investigating an integrated approach to etch emissions
management", MICRO, March 2002, p. 83.

32. Peter Rosenthal, "Gas Analysis Solutions for Yield Improvement of Deposition
Processes for LEDs and Large Area Coatings Applications", Vacuum Technology
and Coating, July 2003, p. 26. Note: It includes FTIR and Micropole Technology.

33. Xi Li. Et. al.,"Specially resolved mass spectrometric sampling of ICPs using a
movable sampling orifice", J. Vac. Sci. Technol. A21(6) (2003)1971.

34. Xi Li. Et. al.,"Mass Spectrometric measurements on inductively coupled
fluorocarbon plasmas: Positive ions, radicals and endpoint detection", J. Vac. Sci.
Technol. A 17(5) (1999) 2438.

35. Mark W.Raynor, et. al., "On-line Impurity Detection in Corrosive Gases Using
Quadrupole Mass Spectrometry", LEOS Newsletter, October 2000, page 9.

Specialized/Unusual Applications of RGAs
1. Don Hall, Wells Shentwu, S. Michael Sterner, and Paul D. Wagner, 1997, "Using
Fluid Inclusions to Explore for Oil and Gas", Hart's Petroleum Engineer
International, No. 11, p. 29-34. Note: SRS RGAs used to examine fluid inclusions
from oil wells.

2. Hadley, Scott W., Don L. Hall, S. Michael Sterner, and Wells Shentwu, 1997,
"Hydrocarbon Pay Delineation and Product Characterization with Fluid Inclusions:
Examples from East Coast Canada and Western Canada Sedimentary Basin", in Can.
Well Log. Soc. in site, Vol. 1, No. 3, p.2-4. Note: SRS RGA s used to examine fluid
inclusions from oil wells.

3. Harmeet Singh, et. al. "Mass spectrometric detection of reactive neutral species:
Beam-to-background ratio", J. Vac. Sci. Technol. A17(5) (1999) 2447

4. Harmeet Singh, J. W. Coburn and David B. Graves, "Appearance potential mass
spectrometry: Discrimination of Dissociative ionization products", J. Vac. Sci.
Technol. A18(2) (2000) 299

5. Babu Chalamala, Robert Wallace and Bruce Gnade, "Poisoning of Spindt-type
molybdenum field emitter arrays by CO2", J. Vac. Sci. Technol. B 16(5) (1998)
2866. Note: SRS RGA100 is used in the study of the effect of CO2 on the emission
characteristics of Spindt-type molybdenum field emission cathode arrays.

6. O. David Sparkman, "The 12th Sanibel Conference on Mass Spectrometry: Field-
Portable and Miniature Mass Spectrometry", J. Am. Soc. Mass Spectrom. 11 (2000)
468. Note: An interesting review of field portable mass spectrometry.

7. Scott A. Furman et. al., "Improving the detection limit of a quadrupole mass
spectrometer", J. Vac. Sci. Technol. A 19(3) (20001) 1032.


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8 Vacuum References www.thinkSRS.com


8. D. R. Ermer, et. al. "Intensity Dependence of Cation Kinetic Energies from 2,5-
dihydroxybenzoic acid near the infrared matrix-assisted laser desorption/ionization
threshold", Journal of Mass Spectrometry, 36 (2001) . Note: An SRS RGA is used in
a TOF setup to determine the mechanism of Ionization of MALDI Matrices. Reprint
kindly submitted by professor Richard Haglund, Jr.

9. R. T. Short et. al. , "Underwater Mass Spectrometers for in situ Chemical analysis of
the Hydrosphere", J. Am. Soc. Mass Spectrom. 12 (2001) 676. Note: An RGA is
used in combination with Membrane Introduction Mass Spectrometry to do
underwater analysis of VOCs.

10. Colin S. Creaser, David Gomez Lamarca, Jeffrey Brum, Christopher Werner,
Anthony P. New and Luisa M. Freitas dos Santos,"Reversed-Phase Membrane Inlet
Mass Spectrometry Applied to the Real-Time Monitoring of Low Molecular Weight
Alcohols in Chloroform", Anal. Chem. 74(2002) 300-304. NOTE: A SRS QMS300
is used to perform real-time MIMS determinations of alcohols in chloroform. RGAs
are rapidly gaining acceptance in this field as their excellent price/performance
value is realized by MIMS practitioners

11. N. Takahashi et. al., "Development of the quadrupole mass spectrometer with the
Bessel-Box type energy analyzer: Function of the energy analyzer in the partial
pressure measurements", J. Vac. Sci. Technol. A 19(4) (2001) 1688

12. H. G. Buhrer, et.al., "Investigating the curing of amino resins with TGA-MS and
TGA-FTIR", UserCom, 2/2001, p. 13. ; Cyril Darribere, "TGA-FTIR and TGA-MS
measurements", UserCom, 2/2001, p. 21. Note: UserCom is a publication of
METTLER TOLEDO (www.mettler.com), specialized in thermal analysis products
including Thermal Gravimetric Analysis and Differential Scanning Calorimetry.
RGAs have recently been interfaced to TGA analyzers providing confirmation of the
nature of the species outgassed by the sample during the heating cycle.

13. C. Richard Arkin, et. al., "Evaluation of Small Mass Spectrometer Systems for
Permanent Gas Analysis", J. Am. Soc. Mass Spec. 13 (2002) 1004. Note: The SRS
RGA100 is compared to several commercial (i.e. Leybold XPR-2 and Ferran
Micropole) and research mass specs and found to be the best match for the analysis
of cryogenic fuels around the Space Shuttle. This paper demonstrates the excellent
accuracy, reproducibility and detectability of gas analysis systems based on SRS
RGAs.

14. V. A. Shamamian et. al. "Mass Aspectrometric Characterization of Pulsed plasmas
for deposition of thin polyethylene Glycol-like Polymer films", Vacuum Technology
and Coating, September 2002, p. 40.

15. Jorge Diaz, Clayton Giese and W. R. Gentry, "Mass Spectrometry for in-situ
volcanic gas monitoring", trends in analytical chemistry, vol. 21, no. 8, 2002. Note:
A QMS300 is used to monitor volcanic gases in-situ. Includes cool pictures of a
QMS300 on top of the Kilauea Volcano in Hawaii.




Stanford Research Systems Phone: (408) 744-9040
www.thinkSRS.com Vacuum References 9

16. Paul LaMarche and Bob Langley, "Dial V for Vacuum", Vacuum Technology and
Coating, March 2003, p. 18.Note: This article describes the practical use of RGAs
for Leak Testing.

17. Marcus B. Wise, Michael R. Guerin, "Direct Sampling Mass Spectrometry", Anal.
Chem., News and Features, Jan 1, 1997, p. 26A. Note: This is a great paper on all
the ways in which mass specs are used to provide real time data for environmental
screening. This is very relevant for QMS system users.

18. Gerardo A. Brucker, "What Else Can a RGA Do?, Vacuum Technology and Coating,
July 2003, p. 36.

19. C. R. Cole, R. A. Outlaw, "Mass Spectral Resolution of F+ and H3O+ in very high
vacuum", J. Vac. Sci. Technol. A 21(5) (2003) 1796. Note: The infamous 19 amu
peak is seen under a completely new light. Note: The 19 amu peak commonly een in
RGAs and other mass sspecs is broken down into its multiple subcomponents and
hydronium ions are identified as an important contributor". Prof. Ron Outlaw uses
SRS RGA Application notes 7 and 9 as references.

20. Several Authors, Filed Emission Arrays, J. Vac. Sci. Technol. B, Vol 21, No. 4,
July/Aug 2003. Note: a compilation of articles on fiel emitter arrays (FEAs) used for
vacuum applications including electron impact ionizers of mass specs.

21. Tom Basalik, "TGA with Evolved Gas Analysis", American Laboratory, 37, Jan
2005, p. 24.

22. J. Wang and U. Burghaus, "Adsorption dynamics of CO2 on Zn-ZnO(0001): A
molecular beam study" J. Chem Phys. 122 (2005)044705. Note: An SRS RGA is
used for the measurements.

High Pressure Sampling/ Differential Pumping
1. Gilbert R. Smith and Robert R. Gidner, Semiconductor International, "Innovative
Gas Handling Technology", June 1997, p. 125

2. Haripov F., J. Vac. Sci. Technol. A 15(4) (1997) 2434, "Rarefied gas flow through a
long tube at arbitrary pressure and temperature drops"

3. Batey J. H. Vacuum 44 (5-7) (1993) 639, "Fractionation in gas inlets for PPA
calibration"

4. Toshio Takiya, Fumio Higashino, Y. Terada, and A. Komura, "Pressure Wave
propagation by gas expansion in a high vacuum tube", J. Vac. Sci. Technol. A 17(4)
(1999) 2059

5. Felix Shapirov, "Rarefied gas flow through a long rectangular channel", J. Vac. Sci.
Technol. A 17(5) (1999) 3062



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10 Vacuum References www.thinkSRS.com


6. Seksan Dheandhanoo, et. al., "Atmospheric Pressure Sample Inlet for Mass
Spectrometers", Rev. Sci. Instr.71 (2000) 4655. Note: a very versatile direct sample
introduction inlet for atmospheric sampling.

7. I. E. Sodal and D. A. Hanna, "Improved mass spectrometer measurements using a
pulsed gas sampling system", J. Vac. Sci. Technol. A 15(1) (1997) 176.

Quantitative Measurements with Residual Gas
Analyzers
1. Bley, Vacuum, 38 (1988) 103-109: "Quantitative measurements with quadrupole
mass spectrometers: important specifications for reliable measurements"

2. Cowen, et. al., J. Vac. Sci. Technol. A 12(1), Jan/Feb 1994: " Non-linearities in
sensitivity of quadrupole partial pressure analyzers operating at higher pressures"

3. L. J. Kieffer, et. al., Reviews of Modern Physics, 38(1) (19966) 1, "Electron Impact
Ionization cross-section Data for Atoms, Atomic Ions, and Diatomic Molecules: I.
Experimental Data"

4. NIST Database: Electron Impact Ionization Cross Sections, Y-K. Kim , et. al. , on-
line version: http://physics.nist.gov/PhysRefData/Ionization/Xsection.html.

5. R. A. Ketola, et. al., Rapid Comm. Mass Spectrom. 13 (1999) 654-662, "A Non-
Linear Asymmetric Error Function based Least Mean Square Approach for the
Analysis of Multicomponent Mass Spectra Measured by Membrane Inlet Mass
Spectrometry"

6. P. J. Abbott et. al. JVST A14(3) (1996) 1242 , "Commercial helium permeation leak
standards: Their properties and reliability".

7. Kimo Welch, "Calibrating Partial Pressure Gauges. A learning experience", Vacuum
Technology and Coating, Nov/Dec 2000, p. 40. Note: A typical Kimo paper. Full of
down-to-earth, "don't do what I did", kind of knowledge.

8. C. Richard Arkin, et. al., "Evaluation of Small Mass Spectrometer Systems for
Permanent Gas Analysis", J. Am. Soc. Mass Spec. 13 (2002) 1004. Note: The SRS
RGA100 is compared to several commercial (i.e. Leybold XPR-2 and Ferran
Micropole) and research mass specs and found to be the best match for the analysis
of cryogenic fuels around the Space Shuttle. This paper demonstrates the excellent
accuracy, reproducibility and detectability of gas analysis systems based on SRS
RGAs.

9. Andrew K. Ottens, W.W. Harrison, Timothy P. Griffin, and William Helms, "Real
time Quantitative Analysis of H2, He, O2 and Ar by Quadrupole Ion Trap Mass
Spectrometry", JASMS 13(2002) 1120. Note: An SRS RGA is used as the standard
to check the ion trap results.


Stanford Research Systems Phone: (408) 744-9040
www.thinkSRS.com Vacuum References 11

10. B. R. F. Kendall, "Pulsed Gas injection for on-line calibration of residual gas
analyzers", J. Vac. Sci. Technol. A 5(1)(1987) 143.

Multiple Linear Regression Analysis Algorithms
1. William H. Press, et. al., 1992, Numerical Recipes in C, The Art of Scientific
Computing, Second Edition, Cambridge Univ. Press, section 15.4, page 671.

2. Bevington, P.R., 1969, Data Reduction and Error Analysis for the Physical Sciences,
New York, McGraw-Hill, Chapters 8-9.

Vacuum System Design
1. J. M. Lafferty, "Foundations of Vacuum Science and Technology", John Wiley
&Sons, New York, 1997. Note: this is, by far, the most useful book on vacuum
related matters your money can buy!

2. Gerhard Lewin, "An elementary introduction to vacuum technique", AVS
Monograph Series published by the Education Committee of the American Vacuum
Society.

3. John T. Yates, "Experimental Innovations in Surface Science. A guide to Practical
Laboratory Methods and Instruments", Springer-Verlag, New York, 1997. Note:
This is an excellent book, with lots of great practical ideas! We highly recommend it.

4. Studt, R&D Magazine, October 1991, p. 104: "Design Away Those Tough Vacuum
System Riddles". Note: Read this one! Make a copy and hang it on your wall!

5. Phil Danielson, Vacuum & ThinFilm, Oct. 1998, "Gas Loads in Vacuum Systems",
p. 37, and "The Value of PumpDown Curves", p. 12.

6. Phil Danielson, Vacuum & ThinFilm, Nov/Dec. 1998, "Rate-of