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File name: | 2605 Inst & Techniques.pdf [preview 2605 Inst & Techniques] |
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Model: | 2605 Inst & Techniques 🔎 |
Original: | 2605 Inst & Techniques 🔎 |
Descr: | Keithley 2600 2605 Inst & Techniques.pdf |
Group: | Electronics > Other |
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File name 2605 Inst & Techniques.pdf A G R E AT E R M E A S U R E O F C O N F I D E N C E Current Source Voltmeter Figure 1. Four-Point Collinear Probe Instrumentation and Configuration = [/ln2] * [V/I] * t * k Techniques for Measuring where: = volume resistivity (ohm-cm) High Resistivity and Hall V= measured voltage (volts) I = source current (amperes) t = sample thickness (cm) Voltage of Semiconducting k = a correction factor based on the ratio of the probe to wafer di- Materials ameter and on the ratio of wafer thickness to probe separation1. van der Pauw Resistivity Measurements Mary Anne Tupta, Keithley Instruments, Inc. The van der Pauw method involves ap- plying a current and measuring voltage us- T ing four small contacts on the periphery of HE resistivity and Hall mobility of conductor measurements are the four-point a flat, arbitrarily shaped sample of uniform semiconducting materials are fun- |
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